Phase transformations in nanocomposite ZrAlN thin films during annealing

نویسندگان

  • Lina Rogström
  • Mats Ahlgren
  • J. Almer
  • Lars Hultman
  • Magnus Odén
  • Jonathan Almer
چکیده

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

High temperature behavior of arc evaporated ZrAlN and TiAlN thin films

Hard coatings can extend the life time of a tool substantially and enable higher cutting speeds which increase the productivity in the cutting application. The aim with this thesis is to extend the understanding on how the microstructure and mechanical properties are affected by high temperatures similar to what a cutting tool can reach during operation. Thin films of ZrAlN and TiAlN have been ...

متن کامل

Thermal and mechanical stability of wurtzite-ZrAlN/cubic-TiN and wurtzite-ZrAlN/cubic-ZrN multilayers

The phase stability and mechanical properties of wurtzite (w)-Zr0.25Al0.75N/cubic (c)-TiN and w-Zr0.25Al0.75N/c-ZrN multilayers grown by arc evaporation are studied. Coherent interfaces with an orientation relation of c-TiN (111)[1-10]ǀ ǀ w-ZrAlN (0001)[11-20] form between ZrAlN and TiN sublayers during growth of the w-ZrAlN/c-TiN multilayer. During annealing at 1100 °C a c-Ti(Zr)N phase forms ...

متن کامل

Structural, Electrical and Optical Properties of Molybdenum Oxide Thin Films Prepared by Post-annealing of Mo Thin Films

Molybdenum thin films with 50 and 150 nm thicknesses were deposited on silicon substrates, using DC magnetron sputtering system, then post-annealed at different temperatures (200, 325, 450, 575 and 700°C) with flow oxygen at 200 sccm (standard Cubic centimeter per minute). The crystallographic structure of the films was obtained by means of x-ray diffraction (XRD) analysis. An atomic force micr...

متن کامل

Structural, Electrical and Optical Properties of Molybdenum Oxide Thin Films Prepared by Post-annealing of Mo Thin Films

Molybdenum thin films with 50 and 150 nm thicknesses were deposited on silicon substrates, using DC magnetron sputtering system, then post-annealed at different temperatures (200, 325, 450, 575 and 700°C) with flow oxygen at 200 sccm (standard Cubic centimeter per minute). The crystallographic structure of the films was obtained by means of x-ray diffraction (XRD) analysis. An atomic force micr...

متن کامل

Carbide and nanocomposite thin films in the Ti-Pt-C system

Thin films in the Ti-Pt-C system were deposited by non-reactive, DC-magnetron sputtering. Samples were characterised using X-ray photoelectron spectroscopy, X-ray diffraction, and transmission electron microscopy. A previously not reported metastable solid solution carbide, (Ti1xPtx)Cy with a Pt/Ti ratio of up to 0.43 was observed. This solid solution phase was present both as single phase in p...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2012